Key features

CIQTEK DB550 Focused Ion Beam Scanning Electron Microscope (FIB-SEM) is an advanced dual-beam system that integrates a high-resolution field emission SEM with a focused ion beam (FIB) column for precise micro- and nano-scale processing and imaging. Designed for high-end research and failure analysis, the DB550 enables accurate sample modification, cross-sectioning, and 3D analysis. With its stable electron and ion beam performance, intelligent automation, and flexible configuration, it is an ideal solution for semiconductor, materials science, and nanotechnology applications.

• Dual-beam system (FIB + SEM) enabling simultaneous imaging and precise material processing at micro- and nano-scale

• High-resolution field emission SEM column for detailed surface imaging with excellent clarity and stability

• Focused ion beam (FIB) column for precise milling, cross-sectioning, deposition, and sample modification

• Capable of site-specific sample preparation, ideal for TEM sample prep and advanced failure analysis

• Supports 3D tomography and reconstruction, allowing in-depth structural analysis of materials

• Advanced electron and ion beam control system for accurate alignment, positioning, and processing

• Multiple detection modes including SE and BSE, providing both topographic and compositional contrast

• Compatible with advanced analytical systems such as EDS and EBSD for comprehensive material characterization

• High-precision motorized stage for accurate and repeatable sample navigation

• Intelligent auto-functions including auto focus, auto stigmation, and beam alignment for improved efficiency

• Stable and efficient vacuum system ensuring reliable performance during long analytical processes

• User-friendly software interface integrating imaging, milling, and analysis in a single platform

• Modular design allowing flexible configuration and future upgrades based on application needs

• Ideal for applications in semiconductors, nanotechnology, materials research, and failure analysis