Key features

Park Systems FX200 Large Sample Atomic Force Microscope (AFM) is a high-performance nanoscale imaging and measurement system designed for large-area samples and advanced research applications. Combining high-resolution AFM capability with a large scan range and precision engineering, the FX200 delivers accurate surface characterization across both micro- and nano-scale structures. Its advanced automation, low-noise design, and flexible configuration make it ideal for semiconductor, materials science, and industrial research environments.

• Designed for large sample measurement, enabling analysis of wafers and oversized specimens with high precision

• Provides high-resolution nanoscale imaging for detailed surface topography and characterization

• Advanced low-noise system design ensuring accurate and reliable measurement results

• Supports a wide range of AFM imaging modes, enabling versatile analysis for different sample types

• Equipped with high-precision XY scanning system for consistent and repeatable measurements

• Automated measurement and control functions to improve workflow efficiency and reduce user dependency

• User-friendly software interface for integrated imaging, analysis, and data management

• Stable mechanical design minimizing vibration for enhanced measurement accuracy

• Flexible configuration allowing customization and future upgrades

• Suitable for applications in semiconductors, advanced materials research, nanotechnology, and failure analysis